For citations:

Rysbaev A.S., Irgashev S.U., Kasimov A.S., Juraeva D.S., Khujaniyazov J.B., Khudoyberdieva M.I. Optimal technological modes of ion implantation and following annealing for forming thin nanosized films of silicides. Eurasian Journal of Physics and Functional Materials. 2020;4(1):50-60. https://doi.org/10.29317/ejpfm.2020040106