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Eurasian Journal of Physics and Functional Materials

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Rysbaev A.S., Bekpulatov I.R., Igamov B.D., Juraev S.X. Change of electrophysical properties of the Si(111) and Si(100) surface in the process of ion implantation and next annealing. Eurasian Journal of Physics and Functional Materials. 2019;3(3):254-259. https://doi.org/10.29317/ejpfm.2019030307

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ISSN 2522-9869 (Print)
ISSN 2616-8537 (Online)