For citations:
Bekpulatov I.R., Rysbaev A.S., Dzhuraev S.K., Kasymov A.S. Development of thermal sensors by implantation ions P+ and B+ in different sides of Si(111). Eurasian Journal of Physics and Functional Materials. 2018;2(4):367-376. https://doi.org/10.29317/ejpfm.2018020409