Optimization of deposition parameters for thin film lithium phosphorus oxynitride (LIPON)

Authors

B. Uzakbaiuly, National Laboratory Astana ,Kazakhstan
A. Mukanova, Nazarbayev University ,Kazakhstan
I. Kurmabbayeva, National Laboratory Astana ,Kazakhstan
Z. B. Bakenov, National Laboratory Astana ,Kazakhstan ,

Article Type

Original Study

Abstract

Thin film of lithium phosphorus oxynitride (LIPON) was successfully deposited by radio frequency (RF) magnetron sputtering technique using a Li₃PO₄ target. The optimal deposition parameters were determined for the thin films with the highest target-substrate distance. Characterization of deposited film was carried out by AFM, FTIR and Raman spectroscopy, which showed incorporation of nitrogen into the film as both doubly, N_d , and possibly triply, N_t, coordinated form. The ac impedance spectroscopy measurements revealed that the highest ionic conductivity of 1.1 µScm^-1 was achieved at room temperature for the samples prepared at the optimum RF power and gas flow conditions.

First Page

174

Last Page

182

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

Recommended Citation

Uzakbaiuly, B.; Mukanova, A.; Kurmabbayeva, I.; and Bakenov, Z. B. (2019) "Optimization of deposition parameters for thin film lithium phosphorus oxynitride (LIPON)," Eurasian Journal of Physics and Functional Materials: Vol. 3: No. 2, Article 9.
DOI: https://doi.org/10.29317/ejpfm.2019030209